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Super Junction LDMOS Transistors - Implementing super junction LDMOS transistors to overcome substrate depletion effects

机译:超结LDMOS晶体管-实现超结LDMOS晶体管以克服衬底耗尽效应

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摘要

The super junction (SJ) concept (Coe et al.) applied to power semiconductor devices is attractive due to its potential for reducing on-resistance at a given breakdown voltage. Discrete SJ vertical power devices have recently become available commercially. However, lateral SJ devices have not materialized for several years partly due to the fact that the lateral SJ structure, implemented on silicon substrates, suffers from substrate-assisted depletion effects which reduce the breakdown voltage. This article discusses the various device structures that have been proposed to eliminate the substrate-assisted depletion effects in SJ-lateral double diffused MOS LDMOS transistors (SJ-LDMOSTs). The concept of the SJ device and vertical and lateral SJ structure was summarized. The substrate-assisted depletion effects are described in detail. The alternative implementations proposed to suppress the substrate effects were then discussed. And the experimental implementation results are summarized and discussed to identify the most likely option for the implementation of lateral SJ-LDMOSTs
机译:应用于功率半导体器件的超级结(SJ)概念(Coe等人)具有吸引力,因为它具有降低给定击穿电压下导通电阻的潜力。分立的SJ垂直功率器件最近已在商业上可用。然而,部分地由于在硅衬底上实现的横向SJ结构受到衬底辅助的耗尽效应的影响而降低了击穿电压,因此横向SJ器件尚未实现几年。本文讨论了已提出的各种器件结构,以消除SJ侧面双扩散MOS LDMOS晶体管(SJ-LDMOST)中的衬底辅助耗尽效应。总结了SJ装置的概念以及垂直和横向SJ结构。详细描述了衬底辅助的耗尽效应。然后讨论了提议的抑制衬底效应的替代实施方案。总结并讨论了实验实施结果,以确定实施横向SJ-LDMOST的最可能选择

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