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Analytical modelling and device design optimisation of epitaxial layer-based III–V tunnel FET

机译:基于外延层III-V隧道FET的分析建模与装置设计优化

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The line tunnelling and heterojunction are two important techniques to improve the performance of the tunnelling field-effect transistors (TFETs). The TFETs that utilise both of these techniques perform superior to the conventional TFETs. The recently proposed T-shaped TFET (TTFET) is one such heterojunction-based line tunnelling device that is expected to become energy efficient switch. For the first time, a physics-based analytical model for surface potential and drain current of epitaxial layer-based heterojunction line TFET has been developed. The model describes the impact of device design parameters on the electrical performance of the device. The Poisson equation is solved with precise boundary conditions to obtain the surface potential model. Kane's model is used to calculate drain current by utilising surface potential model. A good agreement between Synopsys technology computer-aided design simulation and analytical model is observed with 5.4% error in on current at VGS = VDS = 0.5 V, an average error of 5.80% in surface potential and 7.24% in transconductance. Finally, a device design guideline is presented according to the analytical expressions.
机译:线路隧道和异质结是提高隧道场效应晶体管(TFET)性能的两个重要技术。利用这两种技术的TFET优于传统的TFET。最近提出的T形TFET(TTFET)是一种基于异质结的线隧道装置,其预计将成为节能开关。首次,已经开发了一种基于物理基于基于外延的异质结线TFET的表面电位和漏极电流的分析模型。该模型描述了设备设计参数对设备电性能的影响。泊松方程以精确的边界条件求解以获得表面电位模型。 Kane的模型用于通过利用表面电位模型来计算漏极电流。 Synopsys技术计算机辅助设计仿真和分析模型之间的良好一致性在电流上的5.4%误差中观察到 v gs = v ds = 0.5V,表面电位的平均误差为5.80%,跨导的7.24%。最后,根据分析表达式呈现设备设计指南。

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