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Device physics based analytical modeling for electrical characteristics of single gate extended source tunnel FET (SG-ESTFET)

机译:基于设备物理的单门扩展源隧道FET电气特性分析模型(SG-ESTFET)

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In this paper, a two dimensional analytical model for Single Gate Extended Source Tunnel FET has been developed which is based on the solution of Poisson's equation simplified using parabolic approximation method. Different electrical characteristics of device physics such as surface potential, drain current, lateral, and vertical electric field of SG-ESTFET are studied incorporating various parameters like mole fraction of SiGe layer, gate dielectric constants, etc. Furthermore, in modeling and simulation, the depletion region of the drain side is included considering the effect of the fringing field. The sentaurus TCAD device simulator has been used to verify the accuracy and validity of the proposed analytical model for various electrical parameters such as gate to source voltage, mole fraction, and gate dielectric constants. The validity of the proposed model is confirmed by observing a decent agreement between modeling and simulation. The proposed compact model delivers quick and accurate values of various performance parameters.
机译:在本文中,开发了一种用于单门扩展源隧道FET的二维分析模型,其基于使用抛物面近似方法简化的泊松等式的解决方案。研究了诸如SG-ESTFET的表面电位,漏极电流,横向和垂直电场的装置物理的不同电气特性,并在模拟和仿真中掺入了SG-ESTFET的各种参数,如SiGe层,栅极介电常数等。考虑到交叉场的效果,包括漏极侧的耗尽区域。 Sentaurus TCAD设备模拟器已被用于验证所提出的分析模型的准确性和有效性,用于各种电气参数,例如栅极到源电压,摩尔分数和栅极介质常数。通过观察建模和模拟之间的体面协议,确认了所提出的模型的有效性。所提出的紧凑型模型可提供快速准确的各种性能参数值。

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