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Intrinsic point defects in pristine and Zn-doped GaAs nanowire surfaces: A first-principles investigation

机译:原始和Zn掺杂GaAs纳米线表面的固有点缺陷:一致的调查

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Utilizing first-principles calculations, we have systematically investigated on the impact of surface point defects on the stability, electronic and optical properties of pristine and Zn-doped Ga-As nanowires. Different defect types (antisite, interstitial and vacancy defect) and defect sites (surface, subsurface and core layer of nanowires) are considered to build defect models. Results show that As-Ga and Ga-As are respectively the most stable surface defect under As-rich condition and under Ga-rich condition, in both pristine and Zn-doped Ga-As nanowires. Compared with the pristine model, Zn-doped Ga-As nanowire will suffer a more significant surface defects under the same growth conditions due to lower formation energy. In addition, the band structure and electron density difference calculations indicate that Ga-As, As-in and V-Ga act as acceptors, while As-Ga, Ga-in and V-As act as donors. Interestingly, the incorporation of As-Ga defect will notably weaken the p-type character of Zn-doped Ga-As nanowires. Moreover, the optical absorption capability of pristine and Zn-doped Ga-As nanowires will be subject to varying degrees of variation after introducing different defects.
机译:利用第一原理计算,我们系统地研究了表面点缺陷对原始和Zn掺杂GA-AS纳米线的稳定性,电子和光学性质的影响。认为不同的缺陷类型(防易,间隙,空位缺陷)和缺陷部位(纳米线的表面,地下和核心层)被认为构建缺陷模型。结果表明,在原始和Zn掺杂的GA-AS纳米线中,AS-GA和GA - 分别在富含富含条件下和富含GA的条件下最稳定的表面缺陷。与原始模型相比,由于形成能量较低,Zn掺杂Ga-AS纳米线将在相同的生长条件下遭受更显着的表面缺陷。另外,带结构和电子密度差值计算表明GA-AS,AS-IN和V-GA充当受体,而AS-GA,GA-IN和V-AS作为供体的充当。有趣的是,AS-GA缺陷的掺入将尤其削弱Zn掺杂GA-AS纳米线的p型特性。此外,原始和Zn掺杂Ga-as纳米线的光学吸收能力将在引入不同的缺陷后受到不同程度的变化。

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