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Copper-indium-gallium-diselenide/molybdenum layers analyzed by corrected SIMS depth profiles

机译:通过校正的SIMS深度剖面分析铜铟镓二硒化物/钼层

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Polycrystalline copper-indium-gallium-diselenide (CIGS) may act as absorber material for solar radiation in thin film solar cells. CIGS layers are grown on molybdenum back contacts deposited on glass or flexible substrates. During the preparation process, substrate elements diffuse across the back contact into CIGS. We investigate the diffusion into the CIGS/Mo layers by SIMS depth profiling corrected with respect to recoil mixing and atomic mixing. Detaching the CIGS/Mo layers from the substrate allows profiling the layers from surface-side and backside. Thereby, the intermixing effects caused by the sputtering process may be separated. Comparing the surface-side with the mirrored backside depth profile enables us to correct the distortion by recoil mixing, which is anisotropic and different for each element. The remaining profile, now only distorted by atomic mixing (isotropic for all elements), is then corrected with respect to the Mo profile at the interface, which is known to exhibit a step function. Finally, the corrected depth profile allows the determination of diffusion coefficients of impurities in the complex multinary compound system.
机译:多晶铜铟镓二硒化物(CIGS)可以用作薄膜太阳能电池中太阳辐射的吸收材料。 CIGS层生长在沉积在玻璃或柔性基板上的钼背面触点上。在准备过程中,基板元素会通过背面接触扩散到CIGS中。我们通过对反冲混合和原子混合进行校正的SIMS深度剖析来研究扩散到CIGS / Mo层中的情况。从基板上剥离CIGS / Mo层可从表面和背面进行轮廓分析。由此,可以分离由溅射工艺引起的混合效果。将表面侧与镜像的背面深度轮廓进行比较,使我们能够通过反冲混合来校正变形,该变形是各向异性的,并且每个元素都不同。然后,相对于界面处的Mo轮廓校正剩余的轮廓,该轮廓现在仅因原子混合而失真(所有元素各向同性),因此已知具有阶跃函数。最后,校正后的深度分布可以确定复杂多元化合物系统中杂质的扩散系数。

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