首页> 外文期刊>Applied Surface Science >Investigations Of Semiconductor Devices Using Sims; Diffusion, Contamination, Process Control
【24h】

Investigations Of Semiconductor Devices Using Sims; Diffusion, Contamination, Process Control

机译:使用Sims的半导体器件研究;扩散,污染,过程控制

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

We have surveyed 22,155 analyses issues to know the portion of surface analysis at the total analyses activities. According to the survey result, the contribution of SIMS in the total analyses issues was about 7%. The portions of semiconductor process control, composition and contamination in the SIMS analyses issues are 25%, 29% and 16%, respectively. In this article, some examples of the semiconductor device process control, identification of contaminants, and failure analyses have been reviewed. The behavior of H, O, and Ti at the Pt/Ti/GalnZnO interfaces and their influences on the electrical property of thin film transistor are demonstrated. Also discolor issues including organic material contamination problem on Au pad are discussed in detail.
机译:我们调查了22,155个分析问题,以了解表面分析在全部分析活动中所占的比例。根据调查结果,SIMS在所有分析问题中的贡献约为7%。 SIMS分析中半导体过程控制,成分和污染的部分分别为25%,29%和16%。在本文中,对半导体器件过程控制,污染物识别和故障分析的一些示例进行了回顾。证明了H,O和Ti在Pt / Ti / GalnZnO界面上的行为及其对薄膜晶体管电性能的影响。还详细讨论了变色问题,包括金垫上的有机材料污染问题。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号