首页> 外文期刊>Japanese journal of applied physics >Investigation Of Minority Carrier Distribution In Semiconductor-controlled Rectifier Devices And The Impact On Electrostatic Discharge Applications
【24h】

Investigation Of Minority Carrier Distribution In Semiconductor-controlled Rectifier Devices And The Impact On Electrostatic Discharge Applications

机译:半导体控制整流器器件中少数载流子分布及其对静电放电应用的影响的研究

获取原文
获取原文并翻译 | 示例
           

摘要

In this paper, a physical mechanism is proposed where the holding voltage of the semiconductor-controlled rectifier (SCR) is predominated by the accumulation of minority carriers. Two-dimensional simulation is used to demonstrate this mechanism where the carrier distribution of SCR devices is calculated and analyzed. It has been clearly proven that the distribution of minority carriers highly correlates to holding voltage. Accordingly, a layout approach has also been designed and experiments have confirmed that an increment in holding voltage can be performed. It can be concluded that the optimization of the topological structure will markedly increase holding voltage and eventually prevent the complementary metal-oxide-semiconductor (CMOS) integration circuit from minimizing the latch-up effect. Moreover, because of its high current capabilities, the optimized SCR can be used as an ideal candidate for electrostatic discharge protection (ESD) applications.
机译:在本文中,提出了一种物理机制,其中半导体控制整流器(SCR)的保持电压主要由少数载流子的积累决定。二维仿真用于说明这种机制,其中可计算和分析SCR设备的载流子分布。已经清楚地证明,少数载流子的分布与保持电压高度相关。因此,还已经设计了布局方法,并且实验已经证实可以执行保持电压的增加。可以得出结论,拓扑结构的优化将显着增加保持电压,并最终阻止互补金属氧化物半导体(CMOS)集成电路最大程度地减小闩锁效应。此外,由于其高电流能力,经过优化的SCR可以用作静电放电保护(ESD)应用的理想选择。

著录项

  • 来源
    《Japanese journal of applied physics》 |2009年第2期|95-99|共5页
  • 作者单位

    Department of Electrical Engineering, National Tsing Hua University, Hsinchu 300, Taiwan;

    National Nano Device Laboratories, Hsinchu 300, Taiwan;

    Department of Electrical Engineering, National Tsing Hua University, Hsinchu 300, Taiwan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号