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Enhanced piezoelectric properties of (110)-oriented PbZr1−xTixO3 epitaxial thin films on silicon substrates at shifted morphotropic phase boundary

机译:位移相变相界上硅衬底上的(110)取向PbZr1-xTixO3外延薄膜的增强压电性能

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Piezoelectrical, ferroelectrical, and structural properties of epitaxial pseudocubic (110)pc oriented 500 nm thick PbZr1−xTixO3 thin films, prepared by pulsed laser deposition on (001) silicon substrates, were measured as a function of composition. The dependence of the measurement data on the Ti content is explained by an abrupt transition from the rhombohedral r-phase to the tetragonal (c/a)45 phase for x ≈ 0.6, indicating a shift of the Morphotropic Phase Boundary to this value, where the effective piezoelectric coefficient e31,eff and dielectric constant ε33,eff reach their maximum values. These findings are of great significance for Si-based piezo-micro electro mechanical systems, in particular energy harvesters. The largest value of the figure-of-merit for such devices was found for x = 0.6, FOM=24.0 GPa.
机译:测量了通过在(001)硅基板上脉冲激光沉积制备的外延伪立方(110)pc取向的500 nm厚PbZr1-xTixO3薄膜的压电,铁电和结构特性。测量数据对Ti含量的依赖性通过x≈0.6从菱形r相到四方(c / a)45相的突然跃迁来解释,表明向相相界向该值移动,其中有效压电系数e31,eff和介电常数ε33,eff达到最大值。这些发现对于基于硅的压电微机电系统,特别是能量收集器具有重要意义。对于x = 0.6,FOM = 24.0 GPa,发现了此类器件的品质因数最大值。

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    《Applied Physics Letters》 |2014年第9期|1-5|共5页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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