High-sheet-charge-carrier-density AlInN/GaN field-effect transistors on Si(111)

摘要

AlInN/GaN heterostructures have been proposed to possess advantageous properties for field-effect transistors (FETs) over AlGaN/GaN [Kuzmik, IEEE Electron Device Lett. 22, 501 (2001); Yamaguchi , Phys. Status Solidi A 188, 895 (2001)]. A major advantage of such structures is that AlInN can be grown lattice-matched to GaN while still inducing high charge carrier densities at the heterointerface of around 2.7x10(13) cm(-3) by the differences in spontaneous polarization. Additionally, it offers a higher band offset to GaN than AlGaN. We grew AlInN FET structures on Si(111) substrates by metalorganic chemical vapor phase epitaxy with In concentrations ranging from 9.5% to 24%. Nearly lattice-matched structures show sheet carrier densities of 3.2x10(13) cm(-2) and mobilities of similar to406 cm(2)/V s. Such Al0.84In0.16N FETs have maximum dc currents of 1.33 A/mm for devices with 1 mum gate length. (C) 2004 American Institute of Physics.