首页> 外文期刊>Applied Physics Letters >Effect of double-sided (Pb_(0.72)La_(0.28))Ti_(0.93)O_3 buffer layers on the ferroelectric properties of Pb(Zr_(0.52)Ti_(0.48))O_3 thin films
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Effect of double-sided (Pb_(0.72)La_(0.28))Ti_(0.93)O_3 buffer layers on the ferroelectric properties of Pb(Zr_(0.52)Ti_(0.48))O_3 thin films

机译:双面(Pb_(0.72)La_(0.28))Ti_(0.93)O_3缓冲层对Pb(Zr_(0.52)Ti_(0.48))O_3薄膜铁电性能的影响

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摘要

We deposited the Pb(Zr_(0.52)Ti_(0.48))O_3 (PZT) thin films with single and double-sided (Pb_(0.72)Lao_(0.28))Ti_(0.93)O_3 (PLT) buffers by using a pulsed-laser deposition method. With the PLT buffer layers, the remanent polarization values increased, and a remanent polarization value of 33.4 μC/cm~2 was obtained when 10-nm-thick double-sided PLT buffer layers were used. While the coercive field of films slightly increased only with a single-sided PLT buffer, it decreased again by adding the top PLT buffer layer. The film with double-sided PLT buffer also exhibited good fatigue endurance after 10~9 switching cycles even without oxide electrodes, mainly because the accumulated charges were compensated at the interface junction between the PLT buffer layer and the electrode.
机译:我们使用脉冲脉冲沉积(PbT(Zr_(0.52)Ti_(0.48))O_3(PZT)薄膜,该薄膜具有单面和双面(Pb_(0.72)Lao_(0.28))Ti_(0.93)O_3(PLT)缓冲液。激光沉积法。对于PLT缓冲层,剩余极化值增加,当使用10 nm厚的双面PLT缓冲层时,剩余极化值达到33.4μC/ cm〜2。虽然仅使用单面PLT缓冲膜,薄膜的矫顽力场会略有增加,但通过添加顶部PLT缓冲层,膜的矫顽场又会减小。即使没有氧化物电极,带有双面PLT缓冲膜的薄膜在10〜9个开关周期后也表现出良好的耐疲劳性,这主要是因为在PLT缓冲层和电极之间的界面处,累积的电荷得到了补偿。

著录项

  • 来源
    《Applied Physics Letters》 |2005年第3期|p.032903.1-032903.3|共3页
  • 作者单位

    Department of Electrical and Electronic Engineering, Yonsei University, 134, Shinchon-dong, Seodaemoon-ku, Seoul, 120-749, Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;
  • 关键词

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