首页> 外文会议>Materials Science Technology Conference and Exhibition >Strain-enhanced Dielectric and Ferroelectric Properties of Pb(Zr_(0.8)Ti_(0.2))O_3/Pb(Zr_(0.2)Ti_(0.8))O_3 Multilayer Thin Films Without Buffer Layers
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Strain-enhanced Dielectric and Ferroelectric Properties of Pb(Zr_(0.8)Ti_(0.2))O_3/Pb(Zr_(0.2)Ti_(0.8))O_3 Multilayer Thin Films Without Buffer Layers

机译:应变增强的PB(Zr_(0.8)Ti_(0.2))O_3 / PB(Zr_(0.2)Ti_(0.8))O_3多层薄膜而无缓冲层的介电和铁电性能

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A series of Pb(Zr_(1-x)Ti_x)O_3 (PZT) multilayer films were deposited on Pt/Ti/SiO_2/Si substrates by rf magnetron sputtering. All the films comprise 6 periodicities of Pb(Zr_(0.8)Ti_(0.2))O_3/Pb(Zr_(0.2)Ti_(0.8))O_3 with the periodicity thickness of 133 nm, but the layer thicknesses of rhombohedral phase (d_R) and tetragonal phase (d_T) in one periodicity are varied. The electric properties of the films were investigated as a function of dR/dT. The films with dR/dT=1:3 possess enhanced dielectric and ferroelectric properties: dielectric constant epsilon_r=328 at 10 kHz with a reduced dielectric loss tg delta=0.0098 and sharply enhanced remanent polarization P_r=32.6 mu C/cm2. The enhanced properties of the multilayer films were resulted from the presence of interfaces and strain between the rhombohedral and tetragonal phase layers. The mechanism of the strain-enhanced electrical properties was also discussed. This design of multilayer structure can tailor the electric properties and it demonstrates a route to a ferroelectric multilayer film devices.
机译:通过RF磁控溅射沉积在Pt / Ti / SiO_2 / Si基板上沉积一系列Pb(Zr_(1-x)Ti_x)O_3(PZT)多层膜。所有薄膜包含6个PB(Zr_(0.8)Ti_(0.2))O_3 / Pb(Zr_(0.2)Ti_(0.8))O_3的周期性厚度为133nm,但菱形阶段(D_R)的层厚度多种周期性的四方相(D_T)变化。研究了薄膜的电容作为DR / DT的函数。具有DR / DT = 1:3的薄膜具有增强的电介质和铁电性能:介电常数EPSILON_R = 328,在10kHz下,具有降低的介电损耗TG DELTA = 0.0098且急剧增强的再现极化P_R =32.6μC/ cm2。由菱形和四方相层之间的嵌段和菌株存在产生多层膜的增强性能。还讨论了应变增强电性能的机制。这种多层结构的设计可以定制电性能,并且它证明了铁电多层薄膜装置的路线。

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