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首页> 外文期刊>Applied Physics Letters >Influence of residual impurity background on the nonradiative recombination processes in high purity InAs/GaSb superlattice photodiodes
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Influence of residual impurity background on the nonradiative recombination processes in high purity InAs/GaSb superlattice photodiodes

机译:残留杂质背景对高纯度InAs / GaSb超晶格光电二极管非辐射复合过程的影响

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The influence of the impurity background on the recombination processes in type-Ⅱ InAs/GaSb superlattice photodiodes with a cutoff wavelength of approximately 4.8 μm was investigated by electroluminescence measurements. Using an iterative fitting procedure based on the dependence of the quantum efficiency of the electroluminescence on the injection current, the Auger and Shockley-Read-Hall lifetimes were determined for photodiodes with background concentration below 10~(15) cm~(-3). The authors determined in which range of the injection current Shockley-Read-Hall or Auger recombination is predominant. At T = 300 K, the findings indicate that in high quality material with a low background concentration Auger effect becomes the prevalent mechanism even at low applied current.
机译:通过电致发光测量,研究了杂质背景对截止波长约为4.8μm的Ⅱ型InAs / GaSb超晶格光电二极管中复合过程的影响。使用基于电致发光的量子效率对注入电流的依赖性的迭代拟合程序,确定背景浓度低于10〜(15)cm〜(-3)的光电二极管的俄歇寿命和肖克利-雷德霍尔寿命。作者确定在哪种注入电流中,Shockley-Read-Hall或Auger重组在哪个范围内占主导地位。在T = 300 K时,研究结果表明,即使在低施加电流下,在低背景浓度的高质量材料中,俄歇效应也成为普遍的机理。

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