首页> 外文期刊>Applied Physics Letters >Surface recombination velocity reduction in type-Ⅱ InAs/GaSb superlattice photodiodes due to ammonium sulfide passivation
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Surface recombination velocity reduction in type-Ⅱ InAs/GaSb superlattice photodiodes due to ammonium sulfide passivation

机译:硫化铵钝化导致Ⅱ型InAs / GaSb超晶格光电二极管的表面复合速度降低

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The surface recombination velocity (SRV) of minority electrons in a type-Ⅱ InAs/GaSb superlattice photodiode is quantitatively investigated using the electron beam induced current technique and its value used to evaluate the effects of two different passivation methods. Before passivation, the SRV was determined to be (5.0±0.2) X 10~4 cm/s. The SRVs of two samples passivated at room temperature are compared with that of the unpassivated sample. One passivation method, using a neutralized (NH_4)_2S solution for 60 min, reduces the SRV by a factor of 2. The other passivation method, using 4% (NH_4)_2S solution for 30 min, reduces the SRV by more than one order of magnitude.
机译:利用电子束感应电流技术对Ⅱ型InAs / GaSb超晶格光电二极管中少数电子的表面复合速度(SRV)进行了定量研究,其值用于评价两种钝化方法的效果。在钝化之前,SRV被确定为(5.0±0.2)X 10〜4 cm / s。将在室温下钝化的两个样品的SRV与未钝化样品的SRV进行比较。一种钝化方法,使用中和的(NH_4)_2S溶液处理60分钟,将SRV降低2倍。另一种钝化方法,使用4%(NH_4)_2S溶液处理30分钟,将SRV减小一阶以上。数量级。

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