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Three-dimensional imaging of threading dislocations in GaN crystals using two-photon excitation photoluminescence

机译:使用双光子激发光致发光的GaN晶体中的位错的三维成像

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The three-dimensional imaging of threading dislocations in GaN films was demonstrated using two-photon excitation photoluminescence. The threading dislocations were shown as dark lines. The spatial resolutions near the surface were about 0.32 and 3.2 mu m for the in-plane and depth directions, respectively. The threading dislocations with a density less than 10(8)cm(-2) were resolved, although the aberration induced by the refractive index mismatch was observed. The decrease in threading dislocation density was clearly observed by increasing the GaN film thickness. This can be considered a novel method for characterizing threading dislocations in GaN films without any destructive preparations. (c) 2018 The Japan Society of Applied Physics
机译:使用双光子激发光致发光证明了GaN膜中的位错的三维成像。螺纹位错显示为黑线。对于平面内方向和深度方向,表面附近的空间分辨率分别为约0.32和3.2μm。解决了密度小于10(8)cm(-2)的螺纹位错,尽管观察到由折射率不匹配引起的像差。通过增加GaN膜的厚度,可以清楚地观察到穿线位错密度的降低。可以认为这是无需任何破坏性准备即可表征GaN薄膜中的螺纹位错的新颖方法。 (c)2018年日本应用物理学会

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  • 来源
    《Applied physics express》 |2018年第3期|031004.1-031004.4|共4页
  • 作者单位

    Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan;

    Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan;

    Nichia Corp, Anan, Tokushima 7748601, Japan;

    Nichia Corp, Anan, Tokushima 7748601, Japan;

    Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan;

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