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Structural and nanomechanical properties of BiFeO3 thin films deposited by radio frequency magnetron sputtering

机译:射频磁控溅射沉积BiFeO3薄膜的结构和纳米力学性能

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摘要

The nanomechanical properties of BiFeO3 (BFO) thin films are subjected to nanoindentation evaluation. BFO thin films are grown on the Pt/Ti/SiO2/Si substrates by using radio frequency magnetron sputtering with various deposition temperatures. The structure was analyzed by X-ray diffraction, and the results confirmed the presence of BFO phases. Atomic force microscopy revealed that the average film surface roughness increased with increasing of the deposition temperature. A Berkovich nanoindenter operated with the continuous contact stiffness measurement option indicated that the hardness decreases from 10.6 to 6.8 GPa for films deposited at 350°C and 450°C, respectively. In contrast, Young's modulus for the former is 170.8 GPa as compared to a value of 131.4 GPa for the latter. The relationship between the hardness and film grain size appears to follow closely with the Hall–Petch equation.
机译:对BiFeO3(BFO)薄膜的纳米力学性能进行纳米压痕评估。通过使用具有各种沉积温度的射频磁控溅射,在Pt / Ti / SiO2 / Si衬底上生长BFO薄膜。通过X射线衍射分析该结构,结果证实了BFO相的存在。原子力显微镜显示平均膜表面粗糙度随沉积温度的升高而增加。使用连续接触刚度测量选项操作的Berkovich纳米压头表明,分别在350°C和450°C沉积的薄膜硬度从10.6降低到6.8 GPa。相反,前者的杨氏模量为170.8 GPa,而后者的杨氏模量为131.4 GPa。硬度和薄膜晶粒尺寸之间的关系似乎与霍尔—皮奇方程密切相关。

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