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Method of manufacturing thin film solar cell, involves depositing transparent conductive oxide layer as front contact on protective layer by pulsed magnetron sputtering with specific pulse frequency and power density during a pulse
Method of manufacturing thin film solar cell, involves depositing transparent conductive oxide layer as front contact on protective layer by pulsed magnetron sputtering with specific pulse frequency and power density during a pulse
The method involves depositing a metal layer as electrical back contact (3) over a substrate (2). A compound semiconductor is deposited as absorber layer (4) on the electrical back contact. A transparent protective layer (7) is deposited on the absorber layer. A transparent conductive oxide layer is deposited as front contact (8) on the protective layer by pulsed magnetron sputtering with pulse frequency of 100 Hz and power density of 500 W/cm 2 during a pulse. The transparent conductive oxide layer is made of aluminum-doped zinc oxide.
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机译:该方法包括在衬底(2)上沉积金属层作为电背接触(3)。将化合物半导体作为吸收层(4)沉积在电背触点上。透明保护层(7)沉积在吸收层上。在脉冲期间,通过脉冲磁控溅射以100Hz的脉冲频率和500W / cm 2的功率密度,在保护层上沉积透明导电氧化物层作为前接触(8)。透明导电氧化物层由掺杂铝的氧化锌制成。
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