Plasma-Enhanced Chemical Vapor Deposition of Acetylene on Codeposited Bimetal Catalysts Increasing Graphene Sheet Continuity Under Low-Temperature Growth Conditions

摘要

Schematic diagram of electron beam codeposition technique in which we see the Ni and Au pellets are remotely mixed in a crucible before being evaporated onto the substrate. This process serves to completely remove the necessity for pre-growth annealing used in previous literature and allows for a complete monolayer graphene synthesis at 450 °C