化学气相沉积(CVD)是一种重要的薄膜制备工艺,其中微波等离子体辅助化学气相沉积(MP-CVD)被广泛用于制备纳米功能薄膜、硬质薄膜和光学薄膜.介绍一种普适型2.45 GHz微波的MP-CVD系统,包括硬件配置、自动控制软件等,并采用该系统在低温条件下制备高质量石墨烯薄膜.%Chemical vapor deposition (CVD) is one of the important thin film preparation processes, in which the microwave plasma assisted chemical vapor deposition ( MP-CVD) is widely used in the preparation of nano-functional film, hard-coating film and optical film. In this paper, a universal type of 2.45 GHz MP-CVD system is introduced, including details of hardware configuration, control software. At last, high-quality graphene film prepared at low temperature by this system is showed.
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