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Analysis of Photoluminescence Thermal Quenching: Guidance for the Design of Highly Effective p-type Doping of Nitrides

机译:分析光致发光的热猝灭:氮化物的高效p型掺杂设计指南

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摘要

A contact-free diagnostic technique for examining position of the impurity energy level of p-type dopants in nitride semiconductors was proposed based on photoluminescence thermal quenching. The Mg ionization energy was extracted by the phenomenological rate-equation model we developed. The diagnostic technique and analysis model reported here are priorities for the design of highly effective p-doping of nitrides and could also be used to explain the abnormal and seldom analyzed low characteristic temperature T0 (about 100 K) of thermal quenching in p-type nitrides systems. An In-Mg co-doped GaN system is given as an example to prove the validity of our methods. Furthermore, a hole concentration as high as 1.94 × 1018 cm−3 was achieved through In-Mg co-doping, which is nearly one order of magnitude higher than typically obtained in our lab.
机译:提出了一种基于光致发光热猝灭的无接触诊断技术,以检测氮化物半导体中p型掺杂物的杂质能级位置。通过我们开发的现象学速率方程模型提取了镁离子电离能。此处报告的诊断技术和分析模型是设计高效p型氮化物的优先事项,还可以用于解释p型氮化物热淬火的异常且很少分析的低特征温度T0(约100 K)系统。以In-Mg共掺杂GaN系统为例,证明了我们方法的有效性。此外,通过In-Mg共掺杂实现了高达1.94×10 18 cm -3 的空穴浓度,这比通常获得的空穴浓度高了近一个数量级。在我们的实验室。

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