磁控溅射功率对掺Al氧化锌薄膜特性的影响

摘要

The Al-doped ZnO (AZO) films are deposited on glass using RF magnetron sputtering technology under different sputtering pewer : 75 ,120 ,160 ,200 W. The effect of sputtering power on the structural, optical and electrical properties of the AZO films is investigated. The results indicate each of the films has a preferential c-axis orientation and the surface grain size increases with sputtering power increasing. All the films exhibit a high transmittance in visible region and have sharp fundamental absorption edge in the wavelength range of 350 ～400 nm. The resistivity decreases as sputtering power increases, both carder concentration and Hall mobility increase.%利用射频磁控溅射技术在石英玻璃衬底上制备掺Al氧化锌(AZO)薄膜,研究了不同溅射功率(75,120,160,200W)对AZO薄膜的结构、光学和电学特性的影响.结果表明:所制备的AZO薄膜具有良好的c轴择优取向,且随着溅射功率的增加,薄膜的表面颗粒尺寸逐渐增加;薄膜在可见光范围具有较高的透射率,吸收边在350～400nm波段;随着溅射功率的增加,载流子浓度和迁移率逐渐增大,电阻率逐渐下降.