Palladium thin film as a new precious metal material has a variety of important technological applications in many fields because of its excellent physical and chemical properties, such as protective coatings for high temperature, dielectric films in microelectronics and catalysis. It has attracted much attention in recent years due to its excellent properties and potential applications. In this article, the progress and situation on research of precursors for palladium thin films by MOCVD were introduced. The advantages and disadvantages of each precursors were discussed. The current focus and direction in the research field were summarized.%金属钯薄膜作为一种新型的稀贵金属低维材料,因为其优异的物理和化学性能,在耐高温涂层、微电子、膜反应器、催化等领域有着非常重要的应用.钯薄膜优异的性能及广阔的应用前景引起人们广泛的关注.介绍了金属有机化学气相沉积(MOCVD)法制备钯膜用前驱体的研究进展以及MOCVD工艺中各类前驱体的优缺点,概述了其目前研究的热点和进一步研究的方向.
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