采用脉冲激光沉积(PLD)方法在单晶Si衬底上制备AlN薄膜.利用扫描电子显微镜(SEM)、X射线衍射仪(XRD)对薄膜的形貌和微观结构进行了分析；采用显微硬度仪、球-盘式磨损试验机和涂层自动划痕仪测试了薄膜的机械性能.通过正交实验,分析了工艺参数与AlN薄膜硬度之间的关系,得出沉积气压是对薄膜硬度影响大的因素,并研究了沉积气压对AlN薄膜表面形貌、微观结构、沉积速率、硬度、结合力和摩擦性能的影响.实验结果表明:所制备的薄膜均为非晶结构,随着沉积气压的上升,薄膜沉积速率降低,薄膜表面粗糙度降低,摩擦系数变小,当气压由0.1Pa增加到1 Pa时,薄膜的硬度和耐磨性提高,但是随着气压进一步增大,其硬度和耐磨性下降.%Aluminum nitride (A1N) thin films were deposited on monocrystalline silicon (100) substrates by pulsed laser deposition (PLD). The morphology and microstructure of the films were characterized by scanning electron microscopy ( SEM) and X-ray diffractometer, respectively. The mechanical properties of A1N thin films were measured by micro-hardness tester, micrometer automatic scratch tester and ball-on-disk tribometer. The influence of processing parameters on the hardness of A1N films were investigated by means of orthogonal test. It was found that the deposition pressure was the most important parameter in the test, and the influence of deposition pressure on the surface morphology, microstructure, deposition rate, hardness, adhesion and tribological behavior of the films were also investigated. The results showed that all of the films were amorphous. With the rise of deposition pressure, the deposition rate and surface roughness of the films were decreased,and also the friction coefficient when the deposition pressure increased from 0. 1 Pa to 1 Pa, the micro-hardness and wear resistance of the films become better, both of the two properties become worse as the deposition pressure continues to increase.
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