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MOCVD of antimony oxides for gas sensor applications

机译:用于气体传感器应用的氧化锑的MOCVD

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摘要

Thin films of Sb_2O_3 (senarmonite) have been grown by MOCVD from (~nBuO)_3Sb in the temperature range 500 ― 550℃ without addition of a separate oxygen source. In addition, films of Sb_6O_(13)have been deposited at 600℃ using (EtO)_3Sb as the precursor; this latter process is enhanced by the addition of O_2. Preliminary gas sensor trials using the senarmontite films have shown them to have a very high electrical resistance. They exhibit a rapid response to methane and full recovery once the methane is removed.
机译:通过MOCVD从(〜nBuO)_3Sb在500到550℃的温度范围内生长了Sb_2O_3(钠铝锰矿)薄膜,而没有添加单独的氧气源。另外,以(EtO)_3Sb为前驱体在600℃下沉积了Sb_6O_(13)薄膜。通过添加O_2可以增强后面的过程。使用senarmontite膜进行的初步气体传感器试验表明,它们具有很高的电阻。它们显示出对甲烷的快速响应,并且一旦除去甲烷便可以完全回收。

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