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MOCVD of antimony oxides for gas sensor applications

机译:气体传感器应用的锑氧化物的MOCVD

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Thin films of Sb_2O_3 (senarmonite) have been grown by MOCVD from (~nBuO)_3Sb in the temperature range 500 ― 550°C without addition of a separate oxygen source. In addition, films of Sb_6O_(13)have been deposited at 600°C using (EtO)_3Sb as the precursor; this latter process is enhanced by the addition of O_2. Preliminary gas sensor trials using the senarmontite films have shown them to have a very high electrical resistance. They exhibit a rapid response to methane and full recovery once the methane is removed.
机译:SB_2O_3(SENARMONITE)的薄膜已在温度范围为500-550°C的温度范围内的MOCVD(〜NBUO)_3SB,而不加入单独的氧气源。另外,使用(EtO)_3SB作为前体,在600℃下沉积SB_6O_(13)的薄膜;通过添加O_2,后一种过程得到了增强。使用Senarmontite薄膜的初步气体传感器试验已经显示出具有非常高的电阻。当除去甲烷后,它们表现出对甲烷的快速反应和全面恢复。

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