首页> 外文会议>Thirteenth European Conference on Chemical Vapor Deposition, Aug 26-31, 2001, Glyfada, Athens, Greece >Single source MOCVD system for deposition of superconducting films onto moved tapes
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Single source MOCVD system for deposition of superconducting films onto moved tapes

机译:单源MOCVD系统,用于将超导薄膜沉积到移动的磁带上

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摘要

A new single source MOCVD-system was developed, which can be used to coat continuously textured Nickel tapes. To test the YBCO deposition single crystals and IBAD buffered substrates were continuously transported with 4 m/h through the deposition zone. The critical current density of the superconducting layers at 77 K is higher than 4 MA/cm~2 on single crystalline LaAlO_3 and higher than 2 MA/cm~2 on IBAD buffered tapes. Two routes for the buffer layer deposition on Ni are chosen: a) NiO is epitaxially grown onto textured Ni by thermal oxidation. b) In reducing atmosphere textured buffer layers were deposited onto nickel.
机译:开发了一种新的单源MOCVD系统,该系统可用于涂覆连续纹理的镍带。为了测试YBCO沉积,将单晶和IBAD缓冲的基材以4 m / h的速度连续运输通过沉积区。在77 K时,超导层的临界电流密度在单晶LaAlO_3上高于4 MA / cm〜2,在IBAD缓冲带上高于2 MA / cm〜2。选择两种在Ni上沉积缓冲层的途径:a)通过热氧化将NiO外延生长到织构的Ni上。 b)在还原气氛中,将有纹理的缓冲层沉积在镍上。

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