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Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films

机译：用于超导薄膜的金属有机化学气相沉积（mOCVD）的新工艺和设备设计

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by Brian Norio Hubert.

机译：由Brian Norio Hubert撰写。

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Hubert Brian Norio;
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年度 1996
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正文语种 eng
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1. Processing, characterization, and potential applications of YBa/sub 2/Cu/sub 3/O/sub 7//Au and YBa/sub 2/Cu/sub 3/O/sub 7//Au/Si superconducting thin films fabricated by rapid isothermal processing assisted metalorganic chemical vapor deposition [J] . Singh R., Ng J.T.C. IEEE Transactions on Applied Superconductivity . 1993,第1期

机译：YBa / sub 2 / Cu / sub 3 / O / sub 7 // Au和YBa / sub 2 / Cu / sub 3 / O / sub 7 // Au / Si超导薄膜的制备，表征及潜在应用快速等温辅助金属有机化学气相沉积
2. Nanocrystalline ZrO_2 thin films on silicon fabricated by pulsed-pressure metalorganic chemical vapor deposition (PP-MOCVD) [J] . L. Ramirez, M.L. Mecartney, S.P. Krumdieck Journal of Materials Research . 2008,第8期

机译：脉冲压力金属有机化学气相沉积（PP-MOCVD）制备的硅纳米晶ZrO_2薄膜
3. Comparative study on the growth characteristics of ZnO nanowires and thin films by metalorganic chemical vapor deposition (MOCVD) [J] . Min-Chang Jeong, Byeong-Yun Oh, Woong Lee, Journal of Crystal Growth . 2004,第1a2期

机译：金属有机化学气相沉积（MOCVD）的ZnO纳米线和薄膜生长特性的比较研究
4. Metalorganic chemical vapor deposition (MOCVD) and atomic force microscopy (AFM) study of high-quality Bi-2223 superconducting thin films [C] . Kazuhiro Endo, Electrotechnical Lab., Tsukuba-shi, Optoelectronic Integrated Circuit Materials, Physics, and Devices . 1995

机译：高质量Bi-2223超导薄膜的金属有机化学气相沉积（MOCVD）和原子力显微镜（AFM）研究
5. Reduced thermal budget processing of yttrium barium copper oxide superconducting thin films by metalorganic chemical vapor deposition. [D] . Hsu, Neng-Jye. 1992

机译：通过金属有机化学气相沉积减少了钇钡铜氧化物超导薄膜的热预算处理。
6. Metal-Organic Chemical Vapor Deposition (MOCVD) Synthesis of Heteroepitaxial Pr0.7Ca0.3MnO3 Films: Effects of Processing Conditions on Structural/Morphological and Functional Properties [O] . Dr. Maria R Catalano, Giuseppe Cucinotta, Emanuela Schilirò, 2015

机译：金属有机化学气相沉积（MOCVD）异质外延Pr0.7Ca0.3MnO3薄膜的合成：工艺条件对结构/形态和功能特性的影响
7. Processing of PbTiO{sub 3} and Pb(Zr{sub x}Ti{sub 1{minus}x})O{sub 3} thin films by novel single-solid-source metalorganic chemical vapor deposition [O] . Lu, P., Li, H., Sun, S., 1997

机译：新型单固体源金属有机化学气相沉积法制备pbTiO {sub 3}和pb（Zr {sub x} Ti {sub 1 {minus} x}）O {sub 3}薄膜

Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films

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