首页> 外文会议>Tenth International Symposium on Silicon-on-Insulator Technology and Devices Ⅹ, 10th, Mar 25-29, 2001, Washington DC >OBSERVATION OF BULK-TRAP INDUCED GENERATION-RECOMBINATION NOISE IN THE FULLY DEPLETED SOI MOSFET
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OBSERVATION OF BULK-TRAP INDUCED GENERATION-RECOMBINATION NOISE IN THE FULLY DEPLETED SOI MOSFET

机译:完全耗尽的SOI MOSFET的巨量陷阱引起的产生-重组噪声的观察

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摘要

Lorentzian-like noise is observed in the fully depleted SIMOX SOI MOSFET operating in the linear region, with the other surface biased in accumulation. The origin of this noise is attributed to the generation-recombination of carriers at bulk traps in the SOI film. The plateau level and cutoff frequency of the noise are significantly affected by both the temperature and the bias voltage of the opposite gate. This noise may provide a valuable indication of the bulk trap characteristics of the SOI film.
机译:在工作于线性区域的完全耗尽的SIMOX SOI MOSFET中观察到类似洛伦兹的噪声,而另一表面在累积时有偏差。该噪声的起因归因于SOI薄膜中体陷阱处载流子的生成复合。噪声的平稳水平和截止频率受相对栅极的温度和偏置电压的影响很大。该噪声可以提供SOI膜的体阱特性的有价值的指示。

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