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MECHANISMS OF ISLAND VERTICAL ALIGNMENT IN Ge/Si(001) QUANTUM-DOT MULTILAYERS

机译:Ge / Si(001)量子点多层中岛垂直对准的机理

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The effect of vertical ordering in superlattices of self-assembled Ge/Si(001) quantum dots was investigated by a combination of structural and optical characterizations via in situ reflection high-energy electron diffraction, transmission electron microscopy, atomic force microscopy and photoluminescence spectroscopy. We show that the phenomenon of vertical ordering is characterized not only by the alignment of islands along the growth direction but also by a reduction of the critical thickness in subsequent layers. The better the vertical ordering, the more pronounced the reduction of the critical thickness is observed. As a result of this finding, we demonstrate that quantum-dot superlattices in which dots having equal size in all layers can be formed. Furthermore, experiments dealing with the transformation of island shape versus the spacer-layer thickness reveal that preferential nucleation induced by surface roughness may be the main mechanisms responsible for the vertical ordering observed in quantum-dot superlattices.
机译:通过原位反射高能电子衍射,透射电子显微镜,原子力显微镜和光致发光光谱,结合结构和光学特性,研究了自组装Ge / Si(001)量子点超晶格中垂直有序的影响。我们表明,垂直有序现象的特征不仅在于沿生长方向的岛对齐,而且还在于后续层中临界厚度的减小。垂直排序越好,观察到的临界厚度减小越明显。作为该发现的结果,我们证明了可以形成量子点超晶格,其中在所有层中具有相等大小的点。此外,有关岛形相对于间隔层厚度变化的实验表明,由表面粗糙度引起的优先成核可能是导致量子点超晶格中垂直排列的主要机制。

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