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Self-assembled InAs quantum dots and their applications to nanostructure devices grown on GaAs

机译:自组装InAs量子点及其在GaAs上生长的纳米结构器件中的应用

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摘要

We report on the growth and device applications of self-assembled InAs quantum dots on (100)GaAs substrates grown by MBE. A series of distinct current peaks were observed up to 40K in a split-gate heterojunction field-effect transitor (HFET) with self-assembled INAs dots formed on the bottom of thechannel. Up to six electrons seemed to be involved per dot. RTD structure with large sized(800A wide) dots showed hystersis characteristics at 300K due to charging of the dots buried in the cathode side. The operation temperature dependence on device structure and materials are discussed.
机译:我们报告了自组装InAs量子点在MBE生长的(100)GaAs衬底上的生长和器件应用。在分离栅异质结场效应传输器(HFET)中观察到一系列高达40K的电流峰值,在通道底部形成了自组装的INAs点。每个点似乎最多包含六个电子。具有大尺寸(800A宽)点的RTD结构由于埋在阴极侧的点带电,在300K时显示出磁滞特性。讨论了工作温度对器件结构和材料的依赖性。

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