首页> 外文期刊>Applied Physics Letters >InAs/GaAs self-assembled quantum-dot lasers grown by metalorganic chemical vapor deposition—Effects of postgrowth annealing on stacked InAs quantum dots
【24h】

InAs/GaAs self-assembled quantum-dot lasers grown by metalorganic chemical vapor deposition—Effects of postgrowth annealing on stacked InAs quantum dots

机译:金属有机化学气相沉积法生长的InAs / GaAs自组装量子点激光器-生长后退火对堆叠的InAs量子点的影响

获取原文
获取原文并翻译 | 示例

摘要

We investigated the effects of postgrowth annealing on stacked InAs/GaAs quantum dots. The blueshift in emission energy by postgrowth annealing depends on the temperature of postgrowth annealing and the growth conditions of stacked InAs quantum dots, such as a spacer thickness or a stacking number. We can control the peak wavelength of stacked InAs quantum dots by changing the temperature of postgrowth annealing and the growth conditions of stacked InAs quantum dots. We achieved continuous-wave lasing with a threshold current of 16.4 mA at the wavelength of 1.245 μm from five layer vertically aligned InAs quantum dots whose upper cladding layer was grown at 600℃.
机译:我们研究了后生长退火对堆叠的InAs / GaAs量子点的影响。后生长退火引起的发射能量的蓝移取决于后生长退火的温度和堆叠的InAs量子点的生长条件,例如间隔物的厚度或堆叠数。我们可以通过改变生长后退火的温度和堆叠InAs量子点的生长条件来控制堆叠InAs量子点的峰值波长。我们从上覆层在600℃生长的五层垂直排列的InAs量子点,在1.245μm的波长下,以1.6.4 mA的阈值电流实现了连续波激射。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号