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GROWTH OF MONOLAYER MOLYBDENUM DISULFIDE AND DISELENIDE WITH CHEMICAL VAPOR DEPOSITION

机译:化学气相沉积法制得的单层二硫化钼和二硒化物的生长

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摘要

Monolayer molybdenum disulfide (MoS_2) and diselenide (MoSe_2), as semiconductors with a direct band gap, have attracted much attention recently due to their novel properties, and potential application in field effect transistors, photo-electronics, spintronics, valleytronics. Previously, monolayer MoS_2 or MoSe_2 were exfoliated with an adhesive tape. Here, both monolayer MoS_2 and MoSe_2 are synthesized with a very simple chemical vapor deposition method. The as-grown samples are characterized with Raman and photoluminescence, demonstrating the samples are monolayer.
机译:作为具有直接带隙的半导体,单层二硫化钼(MoS_2)和二硒化物(MoSe_2)最近因其新颖的性能以及在场效应晶体管,光电,自旋电子学,硅谷电子学中的潜在应用而备受关注。以前,单层MoS_2或MoSe_2用胶带剥落。在这里,单层MoS_2和MoSe_2都是用非常简单的化学气相沉积方法合成的。生长中的样品具有拉曼光谱和光致发光特性,表明样品是单层的。

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    NOVITAS Center, School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang AVE, 639798 Singapore;

    NOVITAS Center, School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang AVE, 639798 Singapore;

    NOVITAS Center, School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang AVE, 639798 Singapore;

    NOVITAS Center, School of Electrical and Electronic Engineering, and CINTRA CNRS/NTU/THALES, Nanyang Technological University 50 Nanyang AVE, 639798 Singapore;

    School of Materials Science and Engineering, and CINTRA CNRS/NTU/THALES Nanyang Technological University, 50 Nanyang AVE, 639798 Singapore;

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