NOVITAS Center, School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang AVE, 639798 Singapore;
NOVITAS Center, School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang AVE, 639798 Singapore;
NOVITAS Center, School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang AVE, 639798 Singapore;
NOVITAS Center, School of Electrical and Electronic Engineering, and CINTRA CNRS/NTU/THALES, Nanyang Technological University 50 Nanyang AVE, 639798 Singapore;
School of Materials Science and Engineering, and CINTRA CNRS/NTU/THALES Nanyang Technological University, 50 Nanyang AVE, 639798 Singapore;
机译:化学气相沉积催化生长大面积单层二硫化钼薄膜
机译:用不同接种启动子通过化学气相沉积生长单层钼二硫化物的光反对子
机译:在化学气相沉积法制备的多晶单层二硫化钼中观察到负光电导性
机译:单层钼二硫化钼和二烯烃的生长与化学气相沉积
机译:二硫化钼,二硒化钼和钼与铜铟(硫化物,硒化物)之间形成的钼(硫化物,硒化物)的生长和表征。
机译:通过参数优化的化学气相沉积法实现面向应用的二硫化钼(MoS2)单层生长
机译:二硫化钼片之间双层石墨烯的化学气相沉积生长
机译:化学气相沉积的原子薄二硫化钼(mos2)。