Chemical Vapor Deposition of Atomically-Thin Molybdenum Disulfide (MoS2).

摘要

A method of synthesizing monolayers of molybdenum disulfide (MoS2) via chemical vapor deposition is described. In this process a tube furnace is used to evaporate MoS2 over silicon/silicon dioxide substrates. Sulfur is then evaporated and flown over the substrates via a stream of inert gas. Optical and scanning electron microscopy and Raman spectroscopy are utilized to characterize the growth of the MoS2 monolayers. Density-functional theory simulations are used to compare theoretical predictions to the observed photoluminescence