Plasmas and Processes Laboratory, Technological Institute of Aeronautics, Sao Jose dos Campos, 12228-900, Brazil;
rnPlasmas and Processes Laboratory, Technological Institute of Aeronautics, Sao Jose dos Campos, 12228-900, Brazil;
rnPlasmas and Processes Laboratory, Technological Institute of Aeronautics, Sao Jose dos Campos, 12228-900, Brazil;
rnPlasmas and Processes Laboratory, Technological Institute of Aeronautics, Sao Jose dos Campos, 12228-900, Brazil;
rnPlasma Physics Laboratory, Santa Catarina State University, Joinville, 89223-100, Brazil;
rnPlasmas and Processes Laboratory, Technological Institute of Aeronautics, Sao Jose dos Campos, 12228-900, Brazil;
机译:传统和空心阴极磁控溅射系统在二氧化钛薄膜生长上的比较:气体排放与成膜之间的关系
机译:脉冲直流磁控管和空心阴极等离子射流溅射系统中基板总功率密度的比较研究
机译:基于多微空心空心灯气相监测的射频磁控溅射合成铟锌氧化物薄膜的性能
机译:电负气体对常规和空心阴极磁控溅射系统效率的影响
机译:使用非传统空心阴极溅射技术生长和表征碳化硅薄膜。
机译:磁控溅射可生物降解的FeMn箔:锰含量对组织机械腐蚀和磁性的影响
机译:电负性气体对常规和空心阴极磁控溅射系统效率的影响