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Effects of Low-Energy Electron Irradiation on Enhancement-mode AlGaN/GaN high-electron-mobility transistors

机译:低能电子照射对增强型AlGaN / GaN高电子迁移率晶体管的影响

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The effects of low energy (1.8 MeV) electron irradiation on enhancement-mode (E-mode) AlGaN/GaN high electron mobility transistors (HEMTs) have been reported. When the dose up to l.l×10~(16) cm~(-2), the saturation drain current and maximal transconductance of E-mode AlGaN/GaN HEMTs increase after irradiation. However, almost no change of threshold voltage and gate leakage current is observed. The results are explained by the creation of positive charges in the AlGaN layer by ionizing energy loss, especially the creation of N vacancies and Ga vacancies by non-ionizing energy loss. Moreover, low-energy electron irradiation could recover the electron mobility.
机译:已经报道了低能量(1.8MeV)电子照射对增强模式(E模式)AlGaN / GaN高电子迁移率晶体管(HEMT)的影响。当剂量高达L.L×10〜(16)cm〜(-2)时,静电漏极电流和最大跨导的E模式AlGaN / GaN Hemts在照射后增加。然而,几乎没有观察到阈值电压和栅极漏电流的变化。通过电离能量损失,特别是通过非电离能量损失来创建AlGaN层中的正电荷来解释结果。此外,低能量电子照射可以回收电子迁移率。

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