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Finite Volume Method Study on Contact Line Jump Phenomena and Dynamic Contact Angle of Underfill Flow in Flip-Chip of Various Bump Pitches

机译:有限体积方法研究各种凹凸间距倒装芯片填充流动填充流动的接触线跳跃现象和动态接触角

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Three distinct flip-chip underfill cases were considered in this work, with each possess a bump pitch of 0.8 mm, 1.0 mm and 1.2 mm. Contact line jump (CLJ) phenomenon during the underfdl flow were successfully visualized with the aided of finite volume method (FVM) based simulation. The current simulated underfill flow fronts were qualitatively validated with the existing experimental data. Generally, the attachment process occurs much faster than the detachment process, by a factor of 14. Within the investigated pitches range, shorter bump pitch would yield a slower underfill flow but a faster-completion underfill process. The voiding mechanism during the underfill process were presented. Furthermore, the dynamic contact angle of underfill meniscus were analytically computed from the numerical data. The contact angle is found to be varies sinusoidally with the filling time, while the impact of bump pitch is minimal. Lastly, it is found that the bump pitch of flip-chip does affect the void formation and propagation.
机译:在这项工作中考虑了三种不同的倒装芯片填充盒,每个凸起间距为0.8mm,1.0mm和1.2mm。通过基于有限体积法(FVM)的模拟,成功地可视化了接触线跳跃(CLJ)现象。当前模拟的底部填充流程前线与现有的实验数据定性验证。通常,附接过程的发生比分离过程快得多,通过14倍。在调查的间距范围内,较短的凸起间距将产生较慢的底部填充流,但是完成底部填充过程。提出了欠填充过程中的排尿机制。此外,从数值数据分析了欠填充半月板的动态接触角。发现接触角与填充时间内的正弦变化,而凸块间距的冲击是最小的。最后,发现倒装芯片的凸块间距确实影响了空隙形成和传播。

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