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CONTROLLING DENSITY OF PARTICLES WITHIN UNDERFILL SURROUNDING SOLDER BUMP CONTACTS

机译:在未完全包围的焊料接触中控制颗粒的密度

摘要

A method forms an integrated circuit structure, using a manufacturing device, to have kerf regions and external contacts, and to have conductive structures in the kerf regions. The method also forms an underfill material on a surface of the integrated circuit structure, using the manufacturing device, that contacts the kerf regions and the external contacts. The underfill material comprises electrically attracted filler particles that affect the coefficient of thermal expansion and elastic modulus of the underfill material. When forming the underfill material, the method applies an electrical charge to the conductive structures and the external contacts.
机译:一种方法,使用制造装置形成集成电路结构,以具有切口区域和外部接触,并且在切口区域中具有导电结构。该方法还使用制造装置在集成电路结构的表面上形成底部填充材料,该底部填充材料接触切口区域和外部触点。底部填充材料包括电吸引的填充颗粒,这些颗粒影响底部填充材料的热膨胀系数和弹性模量。当形成底部填充材料时,该方法将电荷施加到导电结构和外部触点。

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