The preparation of the highly preferred orientation of AIN thin films on ZnO substrates

摘要

Zinc oxide (ZnO) films were prepared on Si substrates and then aluminum nitride (AIN) films were deposited on ZnO films by radio frequency (RF) magnetron sputtering. The crystal orientation, crystallite structure and surface morphology of AIN/ZnO films were characterized by X-ray diffraction (XRD), Raman spectrum and scanning electron microscopy (SEM).