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Leakage Minimization of 10T Full Adder Using Deep Sub-micron Technique

机译:深次微米技术泄漏最小化10T全加法器

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In this paper we introduced low leakage 10T one-bit full adders cells are proposed for mobile applications. The analysis has been performed on various process and circuits techniques, the analysis with leakage power. We introduced a new transistor resizing approach for 1bit full adder cells to determine the optimal sleep transistor size which reduce the leakage power and area to minimize leakage current. We have performed simulations using Cadence Virtuoso 45nm standard CMOS technology at room temperature with supply voltage of 0.7V. Simulations have been also compared for multiple VDD. Thus design guide-lines have been derived to select the most suitable topology for the design features required. This paper also proposes a novel figure of merit to realistically compare 1-bit adders implemented as a chain of one-bit full adders. The CMOS leakage current at the process level can be decreased by some implement on deep sub micron method. The circuit level technique is reduced power consumption at very high level. In this paper we simulate the 10T Adder using many techniques both circuit level, process level.
机译:在本文中,我们引入了低泄漏10T,为移动应用提出了一钻头全加入剂细胞。对各种过程和电路技术进行了分析,分析泄漏功率。我们介绍了一种新的晶体管调整方法,用于1位完整加法器单元,以确定最佳睡眠晶体管尺寸,减少漏电功率和区域以最小化漏电流。我们在室温下使用Cadence Virtuoso 45nm标准CMOS技术进行了模拟,电源电压为0.7V。还对多个VDD进行了比较了模拟。因此,已经导出设计指导线以选择所需的设计特征的最合适的拓扑。本文还提出了一种新颖的优点,用于现实地比较1位加法者作为一点完整加法器链的链条。在深亚微米法上的一些工具可以减少处理水平的CMOS漏电流。电路电平技术在非常高的水平下降低了功耗。在本文中,我们使用许多电路电平,过程级别模拟了10T加法器。

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