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Leakage Minimization of 10T Full Adder Using Deep Sub-micron Technique

机译:利用深亚微米技术最小化10T全加器的泄漏

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In this paper we introduced low leakage 10T one-bit full adders cells are proposed for mobile applications. The analysis has been performed on various process and circuits techniques, the analysis with leakage power. We introduced a new transistor resizing approach for 1bit full adder cells to determine the optimal sleep transistor size which reduce the leakage power and area to minimize leakage current. We have performed simulations using Cadence Virtuoso 45nm standard CMOS technology at room temperature with supply voltage of 0.7V. Simulations have been also compared for multiple VDD. Thus design guide-lines have been derived to select the most suitable topology for the design features required. This paper also proposes a novel figure of merit to realistically compare 1-bit adders implemented as a chain of one-bit full adders. The CMOS leakage current at the process level can be decreased by some implement on deep sub micron method. The circuit level technique is reduced power consumption at very high level. In this paper we simulate the 10T Adder using many techniques both circuit level, process level.
机译:在本文中,我们介绍了针对移动应用提出的低泄漏10T 1位全加法器单元。已对各种工艺和电路技术进行了分析,并分析了泄漏功率。我们针对1位全加法器单元引入了一种新的晶体管调整大小方法,以确定最佳的睡眠晶体管尺寸,从而减小了泄漏功率和面积,从而将泄漏电流降至最低。我们已经在室温下使用Cadence Virtuoso 45nm标准CMOS技术进行了仿真,电源电压为0.7V。还对多个VDD的仿真进行了比较。因此,已经得出了设计指南,以为所需的设计特征选择最合适的拓扑。本文还提出了一种新颖的品质因数,以现实地比较实现为一比特全加法器的链的一比特加法器。可以通过深亚微米方法的某些工具来降低工艺级的CMOS泄漏电流。电路级技术可以在很高的水平上降低功耗。在本文中,我们使用许多技术来模拟10T加法器,包括电路级,过程级。

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