首页> 外文会议>Conference on ICO >The optical properties of titanium oxide films prepared by dc reactive magnetron sputtering
【24h】

The optical properties of titanium oxide films prepared by dc reactive magnetron sputtering

机译:DC反应磁控溅射制备的氧化钛膜的光学性质

获取原文

摘要

TiO_2 thin films were deposited on the glass substrates by dc reactive magnetron sputtering technique at different sputtering pressures. The films prepared at low pressures have an anatase phase, and the films prepared at high pressures have an amorphous phase. The optical properties were studied by measuring the transmittance and the ellipsometric spectra. The optical constants of the films in the visible range were obtained by fitting the transmittance combined with the ellipsometry measurements using the classical model with one oscillator. The films prepared at the pressure higher than 6 x 10-3 mbar show a volume inhomogeneity. This volume inhomogeneity has been calculated by fitting the transmittance and the ellipsometric spectra.
机译:通过DC反应磁控溅射技术在不同的溅射压力下沉积在玻璃基板上的TiO_2薄膜。在低压下制备的薄膜具有锐钛矿相,并且在高压下制备的膜具有无定形相。通过测量透射率和椭圆谱来研究光学性质。通过使用具有一个振荡器的经典模型将透射率与椭圆形测量结合使用的透射率来获得可见范围中的膜的光学常数。在高于6×10 -3毫巴的压力下制备的薄膜显示出体积不均匀性。通过拟合透射率和椭圆谱来计算该体积不均匀性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号