Synchrotron Grazing Incidence X-ray Scattering and Reflectivity Analysis of Nano-structures and Patterns Supported with Substrates

摘要

The grazing incidence X-ray scattering (GIXS) from structures within a thin film on a substrate is generally a superposition of the two scatterings generated by the two X-ray beams (reflected and transmitted beams) converging on the film with a difference of twice the incidence angle α{sub}i of the X-ray beam in their angular directions; these two scatterings may overlap or may be distinct, depending on α{sub}i. The two scatterings are further distorted by the effects of refraction. These reflection and refraction effects mean that GIXS is complicated to analyze. To quantitatively analyze GIXS patterns, a GIXS formula was derived under the distorted wave Born approximation. We applied this formula to the quantitative analysis of the GIXS patterns obtained for nano-structures and patterns fabricated with various polymer systems, which were supported with substrates. In addition, specular X-ray reflectivity studies were performed the nano-structures and patterns.