Synchrotron Grazing Incidence X-ray Scattering and Reflectivity Analysis of Nano-structures and Patterns Supported with Substrates

摘要

The grazing incidence X-ray scattering (GIXS) from structures within a thin film on a substrate is generally a superposition of the two scatterings generated by the two X-ray beams (reflected and transmitted beams) converging on the film with a difference of twice the incidence angle α_I of the X-ray beam in their angular directions; these two scatterings may overlap or may be distinct, depending on or,. The two scatterings are further distorted by the effects of refraction. These reflection and refraction effects mean that GIXS is complicated to analyze. To quantitatively analyze GIXS patterns, a GIXS formula was derived under the distorted wave Born approximation. We applied this formula to the quantitative analysis of the GIXS patterns obtained for nano-structures and patterns fabricated with various polymer systems, which were supported with substrates. In addition, specular X-ray reflectivity studies were performed the nano-structures and patterns.