聚硅氧烷基纳米多孔薄膜双分形结构的同步辐射小角X射线散射分析

摘要

以聚硅氧烷基材料为预聚体,采用两种核壳型致孔剂,以旋涂工艺分别制备两组聚硅氧烷基纳米多孔薄膜,采用北京同步辐射装置(BSRF)光源进行了小角X射线散射测试,在掠入射模式(入射角αi=0.2°)下得到了两组不同孔隙率纳米多孔薄膜的二维散射数据,在此基础上分析了薄膜的分形特征,发现所制备的薄膜除试样A1外,均存在双分形结构,辅以场发射扫描电子显微镜(FESEM)观测,证实微孔为产生散射的主体.%Two series of polysiloxane nanoporous thin films fabricated by spin-coating processes were measured by the method of grazing-incidence small angle X-ray scattering (GISAXS) at the station of Beijing Synchrotron Radiation Facility (BSRF).And their scattering profiles and scattering intensities were obtained in a very small angle rang (αi =0.2°).On the basis of these data the fractal characters of the nanoporous thin films were analyzed, and two types of fractal structures were found in these samples except for Al.Under the aid of field emission scanning electron microscope (FESEM), the scatterings produced by nanopores were further confirmed.