Fast Marching Simulation of Two-Dimensional Lithography Process of Thick Photoresists

摘要

Fast marching method is an accurate, extremely fast numerical technique in analyzing and computing moving fronts which can develop sharp corners and change topology. We successfully accomplish this method in two dimensions and the two-dimensional lithography process simulation of SU-8 photoresists has been implemented. The obtained results indicate that the fast marching method can actually accelerate the simulation and be used as an effective method for thick photoresist lithography process simulations.