Deposition and characterization of nanostructural IrO_x by RF sputtering

摘要

Large surface area nanostructural IrO_x films were deposited on stainless steel substrates by reactive radio frequency magnetron sputtering using Ir metal target. The structural and spectroscopic properties of the nanostructural IrO_x were characterized. The micrographs of field emission scanning electron microscopy showed the formation of folded leaves with chiffon-like structure for the as-deposited samples. X-ray photoelectron spectroscopy analysis provided the information of the oxidation states and the stoichiometry of IrO_x NL. Raman spectra revealed the amorphous-like phase of the as-deposited nanostructural IrO_x. The chiffon-like structure provides ultra-high surface area for electrical charge storage which makes the IrO_x NL as an attractive candidate for the supercapacitor application.