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机译:反应磁控溅射在碳纳米管模板上沉积和表征IrO_x纳米箔
Department of Electronic Engineering, National Taiwan University of Science and Technology. 43 Keelung Road, Section 4, Taipei 106, Taiwan;
Department of Electronic Engineering, National Taiwan University of Science and Technology. 43 Keelung Road, Section 4, Taipei 106, Taiwan;
Department of Electronic Engineering, National Taiwan University of Science and Technology. 43 Keelung Road, Section 4, Taipei 106, Taiwan;
Department of Electronic Engineering, National Taiwan University of Science and Technology. 43 Keelung Road, Section 4, Taipei 106, Taiwan,Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology, 43 Keelung Road, Section 4, Taipei 106, Taiwan;
Department of Chemical Engineering, National Taiwan University of Science and Technology, 43 Keelung Road, Section 4, Taipei 106, Taiwan;
Department of Electrical Engineering, National Taiwan Ocean University, Keelung 202, Taiwan;
electron microscopy; raman scattering; reactive magnetron sputtering; nanocomposites; oxides;
机译:反应射频磁控溅射在金红石-TiO_2 /蓝宝石(100)模板上沉积纳米结构RuO_2及其结构表征
机译:用反应磁控溅射沉积法在材料体系V–Al–N中沉积和表征硬涂层
机译:MgO模板上中频交流反应磁控溅射LaMnO3盖层的外延生长及表征
机译:通过用线性气体离子源和偏置电压沉积和表征氮化锆(ZrN)薄膜薄膜溅射
机译:脉冲反应直流磁控溅射技术制备的高介电常数薄膜的沉积和表征。
机译:磁控溅射沉积可见光活性光催化钼酸铋薄膜
机译:在三极管磁控溅射系统中模拟氮化钛的反应溅射沉积