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Optical-Capacitance-Transient Spectroscopy Study for Deep Levels in 4H-SiC Epilayer Grown by Cold Wall Chemical Vapor Deposition

机译:冷壁化学气相沉积4H-SIC脱晶仪深度水平的光学电容瞬态光谱研究

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Optical cross sections for deep levels in 4H-SiC grown by cold wall chemical vapor deposition (CVD) were investigated by optical-capacitance-transient spectroscopy (O-CTS). By fitting the measured data with the theoretically calculated curve, we obtained optical excitation energy of 1.50 eV for the Z_(1/2) center. We also obtained its thermal activation energy of 0.61 eV. From these energy values and previously reported the capture barrier and the negative-U property, we drew the configuration coordinate diagram of the Z_(1/2) center, and then the Frank-Condon shift of 0.96-0.97 eV was estimated. In addition, the EH_(6/7) center was also characterized by O-CTS measurements.
机译:通过光学电容瞬态光谱(O-CTS)研究了冷壁化学气相沉积(CVD)的4H-SiC中深度水平的光学横截面。通过用理论计算的曲线将测量数据拟合,我们为Z_(1/2)中心获得1.50 eV的光学激发能量。我们还获得了0.61eV的热激活能量。从这些能量值和先前报告的捕获障碍和负-U属性,我们画出了Z_(1/2)中心的配置坐标图,然后估计了0.96-0.97eV的弗兰克 - 坦克班。此外,EH_(6/7)中心还具有O-CTS测量的特征。

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