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Optical Investigation of Cubic SiC Layers Grown on Hexagonal SiC Substrates by CVD and VLS

机译:CVD和VLS在六方SiC基材上生长的立方SiC层的光学研究

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We report an optical investigation of cubic Silicon Carbide (3C-SiC) layers grown on 6H-SiC substrates by Chemical Vapour Deposition and Vapour-Liquid-Solid mechanism. Micro-Infrared reflectance (μ-IR), micro-Raman (μ-Raman) and low temperature photoluminescence spectroscopies were used for the characterisation of such layers. μ-IR measurements showed unusual optical behaviour of 3C-SiC layers. The difference of refraction index between the 3C-SiC film and the 6H-SiC substrate cannot explain this result. The experimental μ-IR. reflectance spectrum was modelled by introducing a thin (thickness ≤ 0.5 μm) metallic-like (doping ≥ 10~(20) at.cm~(-3)) interfacial film between the layer and the substrate. The photoluminescence spectra revealed the presence of a peak which may be attributed to recombination at the 3C/6H interface. All these results suggest the presence of a two dimensional electron gas at the interface.
机译:通过化学气相沉积和气相 - 固体机制,我们报告了在6H-SiC基材上生长的立方碳化硅(3C-SiC)层的光学研究。微红外反射率(μ-IR),微拉曼(μ-Raman)和低温光致发光光谱用于这些层的表征。 μ-IR测量显示出3C-SIC层的异常光学行为。 3C-SiC膜和6H-SiC衬底之间的折射率差异不能解释这一结果。实验μ-IR。通过在层和基板之间引入薄(厚度≤0.5μm)金属状(掺杂≥10〜(20)的薄膜样(掺杂≥10〜(20)。光致发光光谱显示出峰的存在,其可能归因于在3C / 6H界面处的重组。所有这些结果表明界面处存在二维电子气体。

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