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Electronic structure of graphite/6H-SiC interfaces

机译:石墨/ 6H-SIC接口的电子结构

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We have studied the electronic structure of the interface between 6H-SiC{0001} and graphite. On n-type and p-type 6H-SiC(0001) we observe Schottky barriers of Φ_(b,n)~(Si) = 0.3±0.1 eV and Φ_(b,p)~(Si) = 2.7±0.1 eV, respectively. The observed barrier is face specific: on n-type 6H-SiC(0001) we find Φ_(b,n)~C = 1.3±0.1 eV. The impact of these barriers on the electrical properties of metal/SiC contacts is discussed.
机译:我们研究了6H-SIC {0001}和石墨之间的界面的电子结构。在n型和p型6h-sic(0001)上,我们观察φ_(b,n)〜(si)= 0.3±0.1eV和φ_(b,p)〜(si)= 2.7±0.1eV的肖特基屏障, 分别。观察到的屏障是特定的:在n型6h-sic(0001)上,我们发现φ_(b,n)〜c = 1.3±0.1eV。讨论了这些屏障对金属/ SiC触点电性能的影响。

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