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Heteroepitaxial graphite on 6H-SiC(0001): Interface formation through conduction-band electronic structure

机译:6H-SiC(0001)上的异质外延石墨:通过导带电子结构形成界面

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When annealed at elevated temperatures under vacuum, silicon carbide surfaces show a tendency towards graphitization. Using the sensitivity of empty conduction-band states dispersion towards the Structural quality of the overlayer, we have used angular-resolved inverse photoemission spectroscopy (KRIPES) to monitor the progressive formation of crystalline graphite on 6H-SiC(0001) surfaces. The KRIPES spectra obtained after annealing at 1300 degrees C are characteristic of azimuthally oriented, graphite multilayers of very good single-crystalline quality. For lower annealing temperatures, the ordered interface already presents most of the fingerprints of graphite as soon as 1080 degrees C. The observation of unshifted pi* states, which reveals a very weak interaction with the substrate, is consistent with the growth of a van der Waals heteroepitaxial graphite lattice on top of silicon carbide, with a coincidence lattice of(6 root 3x6 root 3)R30 degrees symmetry. The growth of the first graphene sheet proceeds on top of adatoms characteristic of the (root 3x root 3)R30 degrees reconstruction. These adatoms reduce the chemical reactivity of the substrate. A strong feature located at 6.5 eV above the Fermi level is attributed to states derived from Si vacancies in the C-rich subsurface layers of the SiC substrate. This strongly perturbed substrate can be viewed as a diamondlike phase which acts as a precursor to graphite formation by collapse of several layers. In this framework, previously published soft x-ray photoemission spectra find a natural explanation. [S0163-1829(98)06347-4]. [References: 49]
机译:当在真空下于升高的温度下退火时,碳化硅表面显示出石墨化的趋势。利用空导带态色散对覆盖层结构质量的敏感性,我们使用了角分辨反光电子发射光谱法(KRIPES)来监测6H-SiC(0001)表面上晶体石墨的逐步形成。在1300℃退火后获得的KRIPES光谱是具有很好的单晶质量的方位角取向的石墨多层膜的特征。对于较低的退火温度,有序的界面早在1080摄氏度时就已经显示了石墨的大部分指纹。观察到未移动的pi *状态(揭示与基材的相互作用非常弱)与范德的生长相一致。碳化硅顶部的Waals异质外延石墨晶格,(6根3x6根3)R30度对称的重合晶格。第一石墨烯片的生长在(根3x根3)R30度重建的特征原子之上进行。这些吸附原子降低了底物的化学反应性。位于Fermi能级以上6.5 eV的一个强大特征归因于源自SiC衬底富含C的次表面层中的Si空位的状态。可以将这种受到强烈扰动的基底视为类金刚石相,该相作为通过折叠几层而形成石墨的前体。在此框架中,先前发布的软X射线光发射光谱找到了自然的解释。 [S0163-1829(98)06347-4]。 [参考:49]

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